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Abstract Random defects due to differences in raw materials and the complexity of the manufacturing process are inevitable in engineering structures. Based on the inherent characteristics of sensitivity to defects in the film-substrate system, Monte Carlo method is applied in the study of stability for structures with random defects, coupled with numerical simulation to investigate the morphological evolution and post-buckling equilibrium path of film-substrate systems with random defects under instability. The numerical results show that the critical load of the structure with random defects is unstable, in which the defects significantly reduce the critical load of the structure, and the random defects destroy the symmetry of the structure, transforming the ordered checkerboard pattern into a disordered fold nuclear pattern and affecting the subsequent morphological trend. It assesses the potential risks and effects of random defects in thin film structures and aims to improve the reliability and performance of thin film devices, coatings and surface treatments, while narrowing the gap between theoretical stability research findings and practical design applications.
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Received: 22 March 2024
Published: 11 October 2024
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2024, Vol. 45 
